Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography

المؤلفون المشاركون

Mizoguchi, Hakaru
Hori, Tsukasa
Yanagida, Tatsuya
Fujimoto, Junichi

المصدر

Physics Research International

العدد

المجلد 2012، العدد 2012 (31 ديسمبر/كانون الأول 2012)، ص ص. 1-11، 11ص.

الناشر

Hindawi Publishing Corporation

تاريخ النشر

2012-09-05

دولة النشر

مصر

عدد الصفحات

11

التخصصات الرئيسية

الفلك

الملخص EN

Since 2002, we have been developing a carbon dioxide (CO2) laser-produced tin (Sn) plasma (LPP) extreme ultraviolet (EUV) light source, which is the most promising solution because of the 13.5 nm wavelength high power (>200 W) light source for high volume manufacturing.

EUV lithography is used for its high efficiency, power scalability, and spatial freedom around plasma.

We believe that the LPP scheme is the most feasible candidate for the EUV light source for industrial use.

We have several engineering data from our test tools, which include 93% Sn ionization rate, 98% Sn debris mitigation by a magnetic field, and 68% CO2 laser energy absorption rate.

The way of dispersion of Sn by prepulse laser is key to improve conversion efficiency (CE).

We focus on prepulsed laser pulsed duration.

When we have optimized pulse duration from nanosecond to picosecond, we have obtained maximum 4.7% CE (CO2 laser to EUV; our previous data was 3.8%) at 2 mJ EUV pulse energy.

Based on these data we are developing our first light source as our product: “GL200E.” The latest data and the overview of EUV light source for the industrial EUV lithography are reviewed in this paper.

نمط استشهاد جمعية علماء النفس الأمريكية (APA)

Fujimoto, Junichi& Hori, Tsukasa& Yanagida, Tatsuya& Mizoguchi, Hakaru. 2012. Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography. Physics Research International،Vol. 2012, no. 2012, pp.1-11.
https://search.emarefa.net/detail/BIM-457301

نمط استشهاد الجمعية الأمريكية للغات الحديثة (MLA)

Yanagida, Tatsuya…[et al.]. Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography. Physics Research International No. 2012 (2012), pp.1-11.
https://search.emarefa.net/detail/BIM-457301

نمط استشهاد الجمعية الطبية الأمريكية (AMA)

Fujimoto, Junichi& Hori, Tsukasa& Yanagida, Tatsuya& Mizoguchi, Hakaru. Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography. Physics Research International. 2012. Vol. 2012, no. 2012, pp.1-11.
https://search.emarefa.net/detail/BIM-457301

نوع البيانات

مقالات

لغة النص

الإنجليزية

الملاحظات

Includes bibliographical references

رقم السجل

BIM-457301