Study of some properties of SnO2 thin film

Abstract EN

In this paper thin films of Tin oxide SnO2 was prepared by spray pyrolyess method on glass and pure silicon substrates at deposition temperature (300, 400, 500) ˚C, from Tin chloride at concentration (0.1 M).

The films thickness were about 0.1 ±0.02 μm and Atomization rate was about (1nm / s) The test was done on prepared film by XRD and optical microscopy addition to sensitivity to nitrous oxide gas at different test temperature (25, 50, 75,100) ˚C.

Result shows that the crystallization increased by increasing deposing temperature and the sensitivity increased by rising the gas concentration or temperature.