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Effect of sputtering power on optical properties of RF sputtering deposited Ti6Al4V thin films
Other Title(s)
تأثير القدرة المجهزة لمنظومة الترذيذ بالترددات الراديوية على الخصائص البصرية لأغشية Ti6Al4V الرقيقة
Joint Authors
Khalaf, Muhammad Khammas
Ali, Dawud Salman
Source
Issue
Vol. 15, Issue 33 (31 Aug. 2017), pp.71-77, 7 p.
Publisher
University of Baghdad College of Science
Publication Date
2017-08-31
Country of Publication
Iraq
No. of Pages
7
Main Subjects
Abstract EN
Ti6Al4V thin film was prepared on glass substrate by RF sputtering method.
The effect of RF power on the optical properties of the thin films has been investigated using UV-visible Spectrophotometer.
It's found that the absorbance and the extinction coefficient (k) for deposited thin films increase with increasing applied power, while another parameters such as dielectric constant and refractive index decrease with increasing RF power.
American Psychological Association (APA)
Khalaf, Muhammad Khammas& Ali, Dawud Salman. 2017. Effect of sputtering power on optical properties of RF sputtering deposited Ti6Al4V thin films. Iraqi Journal of Physics،Vol. 15, no. 33, pp.71-77.
https://search.emarefa.net/detail/BIM-791839
Modern Language Association (MLA)
Khalaf, Muhammad Khammas& Ali, Dawud Salman. Effect of sputtering power on optical properties of RF sputtering deposited Ti6Al4V thin films. Iraqi Journal of Physics Vol. 15, no. 33 (2017), pp.71-77.
https://search.emarefa.net/detail/BIM-791839
American Medical Association (AMA)
Khalaf, Muhammad Khammas& Ali, Dawud Salman. Effect of sputtering power on optical properties of RF sputtering deposited Ti6Al4V thin films. Iraqi Journal of Physics. 2017. Vol. 15, no. 33, pp.71-77.
https://search.emarefa.net/detail/BIM-791839
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references : p. 77
Record ID
BIM-791839