Thermal Stability of Neodymium Aluminates High-κ Dielectric Deposited by Liquid Injection MOCVD Using Single-Source Heterometallic Alkoxide Precursors
Joint Authors
Taechakumput, P.
Werner, M.
Taylor, S.
Chalker, P. R.
Gaskell, J. M.
Aspinall, H. C.
Jones, A. C.
Chen, Susu
Zhao, Ce Zhou
Source
Issue
Vol. 2012, Issue 2012 (31 Dec. 2012), pp.1-4, 4 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2012-04-09
Country of Publication
Egypt
No. of Pages
4
Main Subjects
Abstract EN
Thin films of neodymium aluminate (NdAlOx) have been deposited by liquid injection metalorganic chemical vapor deposition (MOCVD) using the bimetallic alkoxide precursor [NdAl(OPri)6(PriOH)]2.
The effects of high-temperature postdeposition annealing on NdAlOx thin films are reported.
The as-deposited thin films are amorphous in nature.
X-ray diffraction (XRD) and medium energy ion scattering (MEIS) show, respectively, no crystallization or interdiffusion of metal ions into the substrate after annealing at 950°C.
The capacitance-voltage (C-V) and current-voltage (I-V) characteristics of the thin films exhibited good electrical integrity following annealing.
The dielectric permittivity (κ) of the annealed NdAlOx was 12, and a density of interface states at flatband (Dit) of 4.01×1011 cm−2 eV−1 was measured.
The deposited NdAlOx thin films are shown to be able to endure high-temperature stress and capable of maintaining excellent dielectric properties.
American Psychological Association (APA)
Taechakumput, P.& Zhao, Ce Zhou& Taylor, S.& Werner, M.& Chalker, P. R.& Gaskell, J. M.…[et al.]. 2012. Thermal Stability of Neodymium Aluminates High-κ Dielectric Deposited by Liquid Injection MOCVD Using Single-Source Heterometallic Alkoxide Precursors. Journal of Nanomaterials،Vol. 2012, no. 2012, pp.1-4.
https://search.emarefa.net/detail/BIM-1029311
Modern Language Association (MLA)
Taechakumput, P.…[et al.]. Thermal Stability of Neodymium Aluminates High-κ Dielectric Deposited by Liquid Injection MOCVD Using Single-Source Heterometallic Alkoxide Precursors. Journal of Nanomaterials No. 2012 (2012), pp.1-4.
https://search.emarefa.net/detail/BIM-1029311
American Medical Association (AMA)
Taechakumput, P.& Zhao, Ce Zhou& Taylor, S.& Werner, M.& Chalker, P. R.& Gaskell, J. M.…[et al.]. Thermal Stability of Neodymium Aluminates High-κ Dielectric Deposited by Liquid Injection MOCVD Using Single-Source Heterometallic Alkoxide Precursors. Journal of Nanomaterials. 2012. Vol. 2012, no. 2012, pp.1-4.
https://search.emarefa.net/detail/BIM-1029311
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-1029311
