Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL2O3–TiC Substrate

Abstract EN

C–F polymer redeposition is generated on the etched sidewall of the patterned air-bearing surface (ABS).

This C–F polymer is a by-product from fluorine-based plasma using a Surface Technology Systems multiplex-pro air-bearing etch (ABE).

The morphology of the re-deposition and the composite element was observed by a scanning electron microscope (SEM).

The chemical bonding results were characterised via X-ray photoelectron spectroscopy, attenuated total reflected infrared spectroscopy and visible Raman spectroscopy.

The purpose of this work is to demonstrate a modification of AlF3 re-deposition to C–F polymer re-deposition, which is easily stripped out by an isopropyl alcohol-based solution.

The benefit of this research is the removal of the re-deposition in the resist strip process without additional cleaning process steps.