الالتصاق الكيميائي لذرة الهيدروجين على سطح صلب و تأثير مجال مغناطيسي خارجي

Abstract EN

The Chemisorptions of Hydrogen atom on tungsten surface is studied in this work.

Our study has two mean goals, the first is to study the dependence of coupling term on the atomic energy levels occupation through out the chemisorptions process.

The second is to study the chemisorptions process for the same system in the existence of external magnetic field.

For this purpose extended model calculation has presented to calculate the atomic energy levels occupation numbers and all the related chemisorptions functions.

The image and correlation effects are all taken into consideration.

The localized states are also determined and calculated as well as their occupation numbers which taken into consideration in the chemisorptions energy calculation.

Throughout our calculations, the general features of the system under consideration have investigated using physical initial conditions getting use of the coupling-occupation numbers dependence.

Our calculations show two types of solutions from its ranges for coupling strength values are characterized.

The first is weak coupling where the solution is magnetic with no localized states.

The second is strong coupling where the solution is nonmagnetic with localized states.

And for the second goal, the chemisorptions process for the system under consideration in the existence of external magnetic field is studied.

Since the external field effect is added as shifts with finite values to the atomic levels.

The atomic levels occupation numbers and the related chemisorptions functions, the localized states and this occupations and the energy are all calculated in the existence of the external field for the three coupling ranges.

Discussion and important conclusions about the band width, the condition for the localized states existence, the image and the correlation effects,are presented.