Study of γ-rays changes of the ZnO thin film structural and optical properties

Abstract EN

Zinc oxide (ZnO) thin films in micro- and nano structures size are very promising candidates for novel applications in emerging thin-film transistors, solar cells, sensors optoelectronic devices.

In this paper, a low-cost sol-gel spin coating technique was used to fabricate ZnO films on glass substrates.

The sol-gel fabrication process of ZnO films is described.

The influence of precursor concentration on the material properties of the ZnO films was investigated.

X-ray diffractometry was employed to examine the structural properties of the ZnO films.

The experimental results reveal that the precursor concentration in the sol-gel spin coating process exerts a strong influence on the properties of the ZnO films.

The effects of the precursor concentration are discussed.

The grain size of the films was calculated using the Scherrer formula.

The optical properties of the ZnO films were characterized with ultraviolet-visible and near IR spectroscopy.

For the deposited and irradiated films, the absorption coefficient, transimition, optical energy gap and urbach energy were determined and analyzed.