Dynamic Deposition of Nanocopper Film on the β-SiCp Surface by Magnetron Sputtering

الملخص EN

The uniform nanocopper film was deposited on the surface of micron β-SiC particle by magnetron sputtering technology successfully.

The surface morphology and phase constitution of the β-SiC particle with nanocopper film were analyzed and dynamic deposition behavior was investigated in detail.

The concept of dynamic deposition was put forward to interpret formation mechanism of copper nanofilm on the surface of β-SiC particles.