Performance Analysis of Ti-Doped In2O3 Thin Films Prepared by Various Doping Concentrations Using RF Magnetron Sputtering for Light-Emitting Device
المؤلفون المشاركون
Chansri, Pakpoom
Arunrungrusmi, Somchai
Poonthong, Wittawat
Mungkung, Narong
Yuji, Toshifumi
المصدر
International Journal of Photoenergy
العدد
المجلد 2020، العدد 2020 (31 ديسمبر/كانون الأول 2020)، ص ص. 1-9، 9ص.
الناشر
Hindawi Publishing Corporation
تاريخ النشر
2020-08-28
دولة النشر
مصر
عدد الصفحات
9
التخصصات الرئيسية
الملخص EN
The influences of doping amounts of TiO2 on the structure and electrical properties of In2O3 films were experimentally studied.
In this study, titanium-doped indium oxide (ITiO) conductions were deposited on glass substrate by the dual-target-type radio frequency magnetron sputtering (RFS) system under different conditions of Ti-doped In2O3 targets, from Ti-0.5 wt% to Ti-5.0 wt%, along with 10 mTorr and 300 W pressure of RF power control that was used as a cost-effective transparent electrochemiluminescence (ECL) cell.
From this process, the correlation between structural, optical, and electrical properties is reported.
It was found that the best 1.14×10−4 Ω cm of resistivity was from Ti-2.5 wt% with the highest carrier concentration (1.15 × 1021 cm-3), Hall mobility (46.03 cm2/V·s), relatively transmittance (82%), and ECL efficiency (0.43 lm·W-1) with well crystalline structured and smooth morphology.
As a result, researchers can be responsible for preparing ITiO thin films with significantly improved microstructure and light intensity performance for the effectiveness of the display devices, as well as its simple process and high performance.
نمط استشهاد جمعية علماء النفس الأمريكية (APA)
Poonthong, Wittawat& Mungkung, Narong& Chansri, Pakpoom& Arunrungrusmi, Somchai& Yuji, Toshifumi. 2020. Performance Analysis of Ti-Doped In2O3 Thin Films Prepared by Various Doping Concentrations Using RF Magnetron Sputtering for Light-Emitting Device. International Journal of Photoenergy،Vol. 2020, no. 2020, pp.1-9.
https://search.emarefa.net/detail/BIM-1173233
نمط استشهاد الجمعية الأمريكية للغات الحديثة (MLA)
Poonthong, Wittawat…[et al.]. Performance Analysis of Ti-Doped In2O3 Thin Films Prepared by Various Doping Concentrations Using RF Magnetron Sputtering for Light-Emitting Device. International Journal of Photoenergy No. 2020 (2020), pp.1-9.
https://search.emarefa.net/detail/BIM-1173233
نمط استشهاد الجمعية الطبية الأمريكية (AMA)
Poonthong, Wittawat& Mungkung, Narong& Chansri, Pakpoom& Arunrungrusmi, Somchai& Yuji, Toshifumi. Performance Analysis of Ti-Doped In2O3 Thin Films Prepared by Various Doping Concentrations Using RF Magnetron Sputtering for Light-Emitting Device. International Journal of Photoenergy. 2020. Vol. 2020, no. 2020, pp.1-9.
https://search.emarefa.net/detail/BIM-1173233
نوع البيانات
مقالات
لغة النص
الإنجليزية
الملاحظات
Includes bibliographical references
رقم السجل
BIM-1173233
قاعدة معامل التأثير والاستشهادات المرجعية العربي "ارسيف Arcif"
أضخم قاعدة بيانات عربية للاستشهادات المرجعية للمجلات العلمية المحكمة الصادرة في العالم العربي
تقوم هذه الخدمة بالتحقق من التشابه أو الانتحال في الأبحاث والمقالات العلمية والأطروحات الجامعية والكتب والأبحاث باللغة العربية، وتحديد درجة التشابه أو أصالة الأعمال البحثية وحماية ملكيتها الفكرية. تعرف اكثر