Model calculation for ion implantation

الملخص EN

In this paper, the diffusion of gas atoms that injected by ion implantation into a layer of certain thickness is studied and investigated by using the equation for the local gas atom concentration.

The ion implantation in to multilayer membrane will be investigated and parameterized, with various situations will be discussed.

Notablly, we assume that the implanted ion flux up on the surface dose not sputter the target atomes or in other words the coefficient of sputtering is small which means that the incident ions are light.