Elaboration et caracterisation de revetement dures ti-al et ti-al-n.

الملخص EN

This work concerns the study of hard coatings of Ti-Al alloys and nitrides of Ti-Al-N.

These materials, in thin films, were prepared by RF magnetron sputtering, PVD.

The influence of deposition parameters and annealing on mechanical properties such as adhesion, microstructure and residual stress has been studied.

The EDS analysis of the Ti-Al films reveals the presence of oxygen in the films.

The thickness of Ti-Al film increases with deposition time.

However, the thickness decreases with the rate of nitrogen introduced into the deposition chamber.

The observation of cross section coating, by scanning electron microscope (MEB), shows that the thickness of the Ti-Al-N film is much lower than that of Ti-Al layers.

Scratch tests show that the doping of nitrogen in the film promotes the adhesion and hardness of the Ti-Al coatings.