SRIM simulation of parameters affecting sputtering yield and chemical structure using Kr, Cu and Pb ions bombardment

الملخص EN

Sputtering yields of various extracted kyrpton , copper and lead ions with energies from 5 – 50 KeV on Polycarbonate/ polybutylene terephthalate film were investigated.

SRIM computer program was used to determine the sputtering yield and supsequntly the change in chemical structure.

The relation between the ion beam energy and sputtering yield of hydrogen, carbon and oxygen was studied.

The effect of ion beam incidence angle on Polycarbonate/ polybutylene terephthalate film was investigated.

The total sputtering yield at an energy of 50 KeV was 1.986, 2.331 and 2.886 for copper, krypton and lead ions respectively.

It is found that the sputtering yield for hydrogen is the highest.

The sputtering yield increases by decreasing the atomic number of the element in the target.