Surface and Interface Properties of 10–12 Unit Cells Thick Sputter Deposited Epitaxial CeO2 Films

المؤلفون المشاركون

Nachimuthu, P.
Wang, Chongmin
Saraf, L. V.
Engelhard, M. H.

المصدر

Advances in Materials Science and Engineering

العدد

المجلد 2008، العدد 2008 (31 ديسمبر/كانون الأول 2008)، ص ص. 1-5، 5ص.

الناشر

Hindawi Publishing Corporation

تاريخ النشر

2008-05-11

دولة النشر

مصر

عدد الصفحات

5

الملخص EN

Ultrathin and continuous epitaxial films with relaxed lattice strain can potentially maintain more of its bulk physical and chemical properties and are useful as buffer layers.

We study surface, interface, and microstructural properties of ultrathin (∼10–12 unit cells thick) epitaxial ceria films grown on single crystal YSZ substrates.

The out-of -plane and in-plane lattice parameters indicate relaxation in the continuous film due to misfit dislocations seen by high-resolution transmission electron microscopy (HRTEM) and substrate roughness of ∼1-2 unit cells, confirmed by atomic force microscopy and HRTEM.

A combination of secondary sputtering, lattice mismatch, substrate roughness, and surface reduction creating secondary phase was likely the cause of surface roughness which should be reduced to a minimum level for effective use of it as buffer layers.

نمط استشهاد جمعية علماء النفس الأمريكية (APA)

Saraf, L. V.& Wang, Chongmin& Engelhard, M. H.& Nachimuthu, P.. 2008. Surface and Interface Properties of 10–12 Unit Cells Thick Sputter Deposited Epitaxial CeO2 Films. Advances in Materials Science and Engineering،Vol. 2008, no. 2008, pp.1-5.
https://search.emarefa.net/detail/BIM-987687

نمط استشهاد الجمعية الأمريكية للغات الحديثة (MLA)

Saraf, L. V.…[et al.]. Surface and Interface Properties of 10–12 Unit Cells Thick Sputter Deposited Epitaxial CeO2 Films. Advances in Materials Science and Engineering No. 2008 (2008), pp.1-5.
https://search.emarefa.net/detail/BIM-987687

نمط استشهاد الجمعية الطبية الأمريكية (AMA)

Saraf, L. V.& Wang, Chongmin& Engelhard, M. H.& Nachimuthu, P.. Surface and Interface Properties of 10–12 Unit Cells Thick Sputter Deposited Epitaxial CeO2 Films. Advances in Materials Science and Engineering. 2008. Vol. 2008, no. 2008, pp.1-5.
https://search.emarefa.net/detail/BIM-987687

نوع البيانات

مقالات

لغة النص

الإنجليزية

الملاحظات

Includes bibliographical references

رقم السجل

BIM-987687