Surface and Interface Properties of 10–12 Unit Cells Thick Sputter Deposited Epitaxial CeO2 Films
Joint Authors
Nachimuthu, P.
Wang, Chongmin
Saraf, L. V.
Engelhard, M. H.
Source
Advances in Materials Science and Engineering
Issue
Vol. 2008, Issue 2008 (31 Dec. 2008), pp.1-5, 5 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2008-05-11
Country of Publication
Egypt
No. of Pages
5
Abstract EN
Ultrathin and continuous epitaxial films with relaxed lattice strain can potentially maintain more of its bulk physical and chemical properties and are useful as buffer layers.
We study surface, interface, and microstructural properties of ultrathin (∼10–12 unit cells thick) epitaxial ceria films grown on single crystal YSZ substrates.
The out-of -plane and in-plane lattice parameters indicate relaxation in the continuous film due to misfit dislocations seen by high-resolution transmission electron microscopy (HRTEM) and substrate roughness of ∼1-2 unit cells, confirmed by atomic force microscopy and HRTEM.
A combination of secondary sputtering, lattice mismatch, substrate roughness, and surface reduction creating secondary phase was likely the cause of surface roughness which should be reduced to a minimum level for effective use of it as buffer layers.
American Psychological Association (APA)
Saraf, L. V.& Wang, Chongmin& Engelhard, M. H.& Nachimuthu, P.. 2008. Surface and Interface Properties of 10–12 Unit Cells Thick Sputter Deposited Epitaxial CeO2 Films. Advances in Materials Science and Engineering،Vol. 2008, no. 2008, pp.1-5.
https://search.emarefa.net/detail/BIM-987687
Modern Language Association (MLA)
Saraf, L. V.…[et al.]. Surface and Interface Properties of 10–12 Unit Cells Thick Sputter Deposited Epitaxial CeO2 Films. Advances in Materials Science and Engineering No. 2008 (2008), pp.1-5.
https://search.emarefa.net/detail/BIM-987687
American Medical Association (AMA)
Saraf, L. V.& Wang, Chongmin& Engelhard, M. H.& Nachimuthu, P.. Surface and Interface Properties of 10–12 Unit Cells Thick Sputter Deposited Epitaxial CeO2 Films. Advances in Materials Science and Engineering. 2008. Vol. 2008, no. 2008, pp.1-5.
https://search.emarefa.net/detail/BIM-987687
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-987687