Electrochemical Deposition of Te and Se on Flat TiO2 for Solar Cell Application
Joint Authors
Kitagawa, Noriyuki
Shibahara, Takahiro
Ito, Seigo
Nishino, Hitoshi
Source
International Journal of Photoenergy
Issue
Vol. 2014, Issue 2014 (31 Dec. 2014), pp.1-5, 5 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2014-04-22
Country of Publication
Egypt
No. of Pages
5
Main Subjects
Abstract EN
Te and Se layers were deposited on 〈glass/FTO/flat-TiO2 〉 by electrochemical deposition.
The Te-Se-stacked layer was annealed at 200°C, and then, the migration of Te into the Se layer by annealing was confirmed using auger electron spectroscopy (AES), which was performed by Te doping on the Se layer.
Au back contact was coated by vacuum deposition on the Te-doped Se layer, resulting in superstrate-structured solar cells of 〈glass/FTO/flat-TiO2/Se-doped Te/Au〉 with a 0.50 V open-circuit voltage, 6.4 mA/cm2 photocurrent density, 0.36 fill factor, and 1.17% conversion efficiency.
American Psychological Association (APA)
Ito, Seigo& Kitagawa, Noriyuki& Shibahara, Takahiro& Nishino, Hitoshi. 2014. Electrochemical Deposition of Te and Se on Flat TiO2 for Solar Cell Application. International Journal of Photoenergy،Vol. 2014, no. 2014, pp.1-5.
https://search.emarefa.net/detail/BIM-1037463
Modern Language Association (MLA)
Ito, Seigo…[et al.]. Electrochemical Deposition of Te and Se on Flat TiO2 for Solar Cell Application. International Journal of Photoenergy No. 2014 (2014), pp.1-5.
https://search.emarefa.net/detail/BIM-1037463
American Medical Association (AMA)
Ito, Seigo& Kitagawa, Noriyuki& Shibahara, Takahiro& Nishino, Hitoshi. Electrochemical Deposition of Te and Se on Flat TiO2 for Solar Cell Application. International Journal of Photoenergy. 2014. Vol. 2014, no. 2014, pp.1-5.
https://search.emarefa.net/detail/BIM-1037463
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-1037463
