Investigation of the Optimal Parameters in Hydrothermal Method for the Synthesis of ZnO Nanorods

Abstract EN

We investigated a two-step method to deposit the ZnO-based nanostructure films, including nanorods and nanoflowers.

In the first step, sputtering method was used to deposit the ZnO films on SiO2/Si substrates as the seed layer.

In the second step, Zn(NO3)2–6H2O and C6H12N4 were used as precursors and hydrothermal process was used as the method to synthesize the ZnO films.

After that, the ZnO films were measured by an X-ray diffraction pattern and a FESEM to analyze their crystallization and morphology.

We had found that the ZnO films had three different morphologies synthesized on ZnO/SiO2/Si substrates, including irregular-plate structure films, nanorod films, and beautiful chrysanthemum-like clusters (nanoflower films).

We would prove that the face direction of ZnO/SiO2/Si substrates in the hydrothermal bottle and deposition time were two important factors to influence the synthesized results of the ZnO films.