Low-Energy Plasma Focus Device as an Electron Beam Source

Abstract EN

A low-energy plasma focus device was used as an electron beam source.

A technique was developed to simultaneously measure the electron beam intensity and energy.

The system was operated in Argon filling at an optimum pressure of 1.7 mbar.

A Faraday cup was used together with an array of filtered PIN diodes.

The beam-target X-rays were registered through X-ray spectrometry.

Copper and lead line radiations were registered upon usage as targets.

The maximum electron beam charge and density were estimated to be 0.31 μC and 13.5×1016/m3, respectively.

The average energy of the electron beam was 500 keV.

The high flux of the electron beam can be potentially applicable in material sciences.