Comment on “Facile Deposition of Ultrafine Silver Particles on Silicon Surface Not Submerged in Precursor Solutions for Applications in Antireflective Layer”

Abstract EN

We have investigated the recent research article, titled “Facile Deposition of Ultrafine Silver Particles on Silicon Surface Not Submerged in Precursor Solutions for Applications in Antireflective Layer” by Jiang et al.

[1].

The authors systematically organized the silver nanoparticles on Si substrates, which is a very effective approach to reduce the reflection by forming Si porous structures.

The ultrafine porous Si showed significantly suppressed reflection about less than 5% for broad wavelengths.

This result bears a high potential of Si photoelectric devices, including photodetectors and solar cells.