Study of Magnetization Reversal Process in FeCoRuFeCo Exchange Coupled Synthetic Antiferromagnetic Multilayers

Abstract EN

FeCo/Ru/FeCo exchange coupled synthetic antiferromagnetic multilayers were prepared with two sputtering modes.

One is continuous sputtering mode, and the other mode is layer-by-layer sputtering mode.

The former mode implies that substrate faced the target and film growth process was continuous when FeCo layers were sputtering, whereas the latter implies that substrate was rotating with the mask at a speed of 5 rpm when FeCo layers were sputtering.

It was found that the exchange coupling field H e x of sample sputtered by layer-by-layer mode was higher than the one sputtered by continuous mode.

Domain structures were measured with applying varied in-plane magnetic fields along the easy axis in order to study the magnetization reversal process.

We found it is a domain wall move process.

When the applied field is smaller than H e x , both the two magnetic layers have domain structure and the domain structure of the two layers is reversed correspondingly.

When the applied field is varying in the range of - H e x to H e x , the domain wall of the two layers moves correspondingly at the same time.