Dynamic Deposition of Nanocopper Film on the β-SiCp Surface by Magnetron Sputtering
Joint Authors
Ming, Hu
Yunlong, Zhang
Lin, Shan
Lili, Tang
Jing, Gao
Xiaoxue, Ren
Peiling, Ding
Source
Issue
Vol. 2015, Issue 2015 (31 Dec. 2015), pp.1-6, 6 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2015-05-25
Country of Publication
Egypt
No. of Pages
6
Main Subjects
Abstract EN
The uniform nanocopper film was deposited on the surface of micron β-SiC particle by magnetron sputtering technology successfully.
The surface morphology and phase constitution of the β-SiC particle with nanocopper film were analyzed and dynamic deposition behavior was investigated in detail.
The concept of dynamic deposition was put forward to interpret formation mechanism of copper nanofilm on the surface of β-SiC particles.
American Psychological Association (APA)
Ming, Hu& Yunlong, Zhang& Lin, Shan& Lili, Tang& Jing, Gao& Xiaoxue, Ren…[et al.]. 2015. Dynamic Deposition of Nanocopper Film on the β-SiCp Surface by Magnetron Sputtering. Journal of Nanomaterials،Vol. 2015, no. 2015, pp.1-6.
https://search.emarefa.net/detail/BIM-1069336
Modern Language Association (MLA)
Ming, Hu…[et al.]. Dynamic Deposition of Nanocopper Film on the β-SiCp Surface by Magnetron Sputtering. Journal of Nanomaterials No. 2015 (2015), pp.1-6.
https://search.emarefa.net/detail/BIM-1069336
American Medical Association (AMA)
Ming, Hu& Yunlong, Zhang& Lin, Shan& Lili, Tang& Jing, Gao& Xiaoxue, Ren…[et al.]. Dynamic Deposition of Nanocopper Film on the β-SiCp Surface by Magnetron Sputtering. Journal of Nanomaterials. 2015. Vol. 2015, no. 2015, pp.1-6.
https://search.emarefa.net/detail/BIM-1069336
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-1069336
