Influence of Deposition Condition on Y2O3 Coatings Produced by Pulsed Electrophoretic Deposition
Joint Authors
Ota, Toshitaka
Ichikawa, Asumi
Suzuki, Hisao
Miyazaki, Hidetoshi
Source
Advances in Materials Science and Engineering
Issue
Vol. 2016, Issue 2016 (31 Dec. 2016), pp.1-7, 7 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2016-05-16
Country of Publication
Egypt
No. of Pages
7
Abstract EN
Y2O3 nanoparticle suspension aqueous solution was prepared using citric acid.
Then, Y2O3 film was deposited using this solution with pulsed electrophoretic deposition (EPD).
A dense Y2O3 film of 25.7 μm thickness was obtained with deposition conditions of 0.5 wt% Y2O3 concentration, bias voltage of 0.5 V, and bias frequency of 1 kHz.
The respective resistivities of the as-deposited film and films heat-treated at 200°C and 400°C were 2.84 × 103 Ω·cm, 5.36 × 104 Ω·cm, and 2.05 × 106 Ω·cm.
A 59.8 μm thick dense Y2O3 film was obtained using two-step deposition with change of the bias voltage: a first step of 0.5 V and a second step of 2.0 V.
American Psychological Association (APA)
Miyazaki, Hidetoshi& Ichikawa, Asumi& Suzuki, Hisao& Ota, Toshitaka. 2016. Influence of Deposition Condition on Y2O3 Coatings Produced by Pulsed Electrophoretic Deposition. Advances in Materials Science and Engineering،Vol. 2016, no. 2016, pp.1-7.
https://search.emarefa.net/detail/BIM-1096480
Modern Language Association (MLA)
Miyazaki, Hidetoshi…[et al.]. Influence of Deposition Condition on Y2O3 Coatings Produced by Pulsed Electrophoretic Deposition. Advances in Materials Science and Engineering No. 2016 (2016), pp.1-7.
https://search.emarefa.net/detail/BIM-1096480
American Medical Association (AMA)
Miyazaki, Hidetoshi& Ichikawa, Asumi& Suzuki, Hisao& Ota, Toshitaka. Influence of Deposition Condition on Y2O3 Coatings Produced by Pulsed Electrophoretic Deposition. Advances in Materials Science and Engineering. 2016. Vol. 2016, no. 2016, pp.1-7.
https://search.emarefa.net/detail/BIM-1096480
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-1096480