Electrodeposition-Based Fabrication and Characteristics of Tungsten Trioxide Thin Film

Abstract EN

In this study, tungsten trioxide (WO3) thin films were electrodeposited on indium tin oxide (ITO) glass to form WO3-coated glass.

The electrodeposition (ED) time (tED) and ED current (IED) were varied to control the film thickness and morphology.

Furthermore, the crystallization of the thin films was controlled by annealing them at 250°C, 500°C, and 700°C.

The results showed that the thickness of the WO3 thin films increased with tED and IED.

The as-deposited thin films and those annealed at 250°C were amorphous, whereas the WO3 thin films annealed at 500 and 700°C were in the anorthic phase.

Moreover, the amorphous WO3-coated glass exhibited high transmittance in visible light and low transmittance in near-infrared light, whereas the anorthic WO3-coated glass had high transmittance in near-infrared light.

An empirical formula for determining the thickness of WO3 thin films was derived through multiple regressions of the ED process parameters.