Characteristics of Silicon Dioxide Particles in PCVD Synthesizing Silica Glass Process
Joint Authors
Sun, Yuancheng
Song, Xuefu
Du, Xiurong
Zhang, Xiaoqiang
Wang, Hui
Source
Issue
Vol. 2016, Issue 2016 (31 Dec. 2016), pp.1-6, 6 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2016-02-17
Country of Publication
Egypt
No. of Pages
6
Main Subjects
Abstract EN
SiO2 nanoparticles in PCVD process were investigated by SEM, TEM, and optical emission spectra (OES).
There are large spherical SiO2 particles with diameter of 50–200 nm and more small particles about 10–50 nm in PCVD process.
Size of SiO2 particles is influenced by distance and feeding speed but not electron temperature.
The amount of large spherical SiO2 particles decreases with the increase of distance and decrease of feeding speed due to lower concentration.
In addition, the evolution of SiO2 particles was inferred from the experimental results.
American Psychological Association (APA)
Sun, Yuancheng& Song, Xuefu& Du, Xiurong& Zhang, Xiaoqiang& Wang, Hui. 2016. Characteristics of Silicon Dioxide Particles in PCVD Synthesizing Silica Glass Process. Journal of Nanotechnology،Vol. 2016, no. 2016, pp.1-6.
https://search.emarefa.net/detail/BIM-1109629
Modern Language Association (MLA)
Sun, Yuancheng…[et al.]. Characteristics of Silicon Dioxide Particles in PCVD Synthesizing Silica Glass Process. Journal of Nanotechnology No. 2016 (2016), pp.1-6.
https://search.emarefa.net/detail/BIM-1109629
American Medical Association (AMA)
Sun, Yuancheng& Song, Xuefu& Du, Xiurong& Zhang, Xiaoqiang& Wang, Hui. Characteristics of Silicon Dioxide Particles in PCVD Synthesizing Silica Glass Process. Journal of Nanotechnology. 2016. Vol. 2016, no. 2016, pp.1-6.
https://search.emarefa.net/detail/BIM-1109629
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-1109629
