Incorporation of Boron Atoms on Graphene Grown by Chemical Vapor Deposition Using Triisopropyl Borate as a Single Precursor
Joint Authors
Maia da Costa, M. E. H.
Larrude, Dunieskys G.
Freire, Fernando L.
Romani, E. C.
Mariotto, G.
Source
Issue
Vol. 2017, Issue 2017 (31 Dec. 2017), pp.1-8, 8 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2017-06-13
Country of Publication
Egypt
No. of Pages
8
Main Subjects
Abstract EN
We synthesized single-layer graphene from a liquid precursor (triisopropyl borate) using a chemical vapor deposition.
Optical microscopy, scanning electron microscopy, Raman spectroscopy, and X-ray photoelectron spectroscopy measurements were used for the characterization of the samples.
We investigated the effects of the processing temperature and time, as well as the vapor pressure of the precursor.
The B1s core-level XPS spectra revealed the presence of boron atoms incorporated into substitutional sites.
This result, corroborated by the observed upshift of both G and 2D bands in the Raman spectra, suggests the p-doping of single-layer graphene for the samples prepared at 1000°C and pressures in the range of 75 to 25 mTorr of the precursor vapor.
Our results show that, in optimum conditions for single-layer graphene growth, that is, 1000°C and 75 mTorr for 5 minutes, we obtained samples presenting the coexistence of pristine graphene with regions of boron-doped graphene.
American Psychological Association (APA)
Romani, E. C.& Larrude, Dunieskys G.& Maia da Costa, M. E. H.& Mariotto, G.& Freire, Fernando L.. 2017. Incorporation of Boron Atoms on Graphene Grown by Chemical Vapor Deposition Using Triisopropyl Borate as a Single Precursor. Journal of Nanomaterials،Vol. 2017, no. 2017, pp.1-8.
https://search.emarefa.net/detail/BIM-1183823
Modern Language Association (MLA)
Romani, E. C.…[et al.]. Incorporation of Boron Atoms on Graphene Grown by Chemical Vapor Deposition Using Triisopropyl Borate as a Single Precursor. Journal of Nanomaterials No. 2017 (2017), pp.1-8.
https://search.emarefa.net/detail/BIM-1183823
American Medical Association (AMA)
Romani, E. C.& Larrude, Dunieskys G.& Maia da Costa, M. E. H.& Mariotto, G.& Freire, Fernando L.. Incorporation of Boron Atoms on Graphene Grown by Chemical Vapor Deposition Using Triisopropyl Borate as a Single Precursor. Journal of Nanomaterials. 2017. Vol. 2017, no. 2017, pp.1-8.
https://search.emarefa.net/detail/BIM-1183823
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-1183823