The structure and electrical properties of porous silicon prepared by electrochemical etching

Abstract EN

Porous silicon was prepared by using electrochemical etching process.

The structure, electrical, and photoelectrical properties had been performed.

Scanning Electron Microscope (SEM) observations of porous silicon layers were obtained before and after rapid thermal oxidation process.

The rapid thermal oxidation process did not modify the morphology of porous layers.

The unique observation was the pore size decreased after oxidation ; pore number and shape were conserved.

The wall size which separated between pore was increased after oxidation and that effected on charge transport mechanism of PS.