Effect of the thickness and annealing temperature on the structural properties of thin CdS films prepared by thermal evaporation

Abstract EN

A thin CdS Films have been evaporated by thermal evaporation technique with different thicknesses (500, 1000, 1500 and 2000 ˚A)ِ and different duration times of annealing (60, 120 180 minutes) under 573 K annealing temperature, the vacuum was about 8 × 10-5 mbar and substrate temperature was 423 K.

The structural properties of the films have been studied by X- ray diffraction technique (XRD).

The crystal growth became stronger and more oriented as the film thickness (T) and duration time of annealing (Ta) increases.