Characterization of the Chemical Kinetics in an O2HMDSO RF Plasma for Material Processing
Joint Authors
Zanini, Stefano
Riccardi, Claudia
Barni, Ruggero
Source
Advances in Physical Chemistry
Issue
Vol. 2012, Issue 2012 (31 Dec. 2012), pp.1-6, 6 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2012-11-19
Country of Publication
Egypt
No. of Pages
6
Main Subjects
Abstract EN
Experimental study of the plasma gas phase in low-pressure radiofrequency discharges of oxygen and hexamethyldisiloxane is presented.
The plasma phase has been studied by means of optical emission spectroscopy.
Mass spectroscopy of the neutral and of the charged species has been performed too, directly sampling the plasma gas phase, by a dedicated spectrometer.
We also measured the ion energy distribution.
We have studied the influence of the operating conditions on the plasma gas-phase composition which plays a primary role in the formation process of SiO2 films, which are known for their important applicative uses.
American Psychological Association (APA)
Barni, Ruggero& Zanini, Stefano& Riccardi, Claudia. 2012. Characterization of the Chemical Kinetics in an O2HMDSO RF Plasma for Material Processing. Advances in Physical Chemistry،Vol. 2012, no. 2012, pp.1-6.
https://search.emarefa.net/detail/BIM-454343
Modern Language Association (MLA)
Barni, Ruggero…[et al.]. Characterization of the Chemical Kinetics in an O2HMDSO RF Plasma for Material Processing. Advances in Physical Chemistry No. 2012 (2012), pp.1-6.
https://search.emarefa.net/detail/BIM-454343
American Medical Association (AMA)
Barni, Ruggero& Zanini, Stefano& Riccardi, Claudia. Characterization of the Chemical Kinetics in an O2HMDSO RF Plasma for Material Processing. Advances in Physical Chemistry. 2012. Vol. 2012, no. 2012, pp.1-6.
https://search.emarefa.net/detail/BIM-454343
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-454343