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Growth of Single-Walled Carbon Nanotubes by Plasma CVD
Joint Authors
Kato, Toshiaki
Hatakeyama, Rikizo
Source
Issue
Vol. 2010, Issue 2010 (31 Dec. 2010), pp.1-11, 11 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2010-12-27
Country of Publication
Egypt
No. of Pages
11
Main Subjects
Engineering Sciences and Information Technology
Chemistry
Abstract EN
Recent research in plasma chemical vapor deposition (CVD) for single-walled carbon nanotube (SWNT) growth has achieved low-temperature synthesis, individually freestanding formation, and structure control of diameter, chirality, and length.
Detailed growth kinetics of SWNTs are revealed using a combination of techniques for plasma control and nanomaterial analysis.
Plasma CVD also allows tube metallicity to be controlled by tuning the mean diameter of SWNTs.
This plasma CVD progress contributes to the next stage of nanotube fabrication, which is required for practical use of SWNTs in a variety of applications.
American Psychological Association (APA)
Kato, Toshiaki& Hatakeyama, Rikizo. 2010. Growth of Single-Walled Carbon Nanotubes by Plasma CVD. Journal of Nanotechnology،Vol. 2010, no. 2010, pp.1-11.
https://search.emarefa.net/detail/BIM-457908
Modern Language Association (MLA)
Kato, Toshiaki& Hatakeyama, Rikizo. Growth of Single-Walled Carbon Nanotubes by Plasma CVD. Journal of Nanotechnology No. 2010 (2010), pp.1-11.
https://search.emarefa.net/detail/BIM-457908
American Medical Association (AMA)
Kato, Toshiaki& Hatakeyama, Rikizo. Growth of Single-Walled Carbon Nanotubes by Plasma CVD. Journal of Nanotechnology. 2010. Vol. 2010, no. 2010, pp.1-11.
https://search.emarefa.net/detail/BIM-457908
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-457908