Transparent oxide MgO thin films prepanred by reactive pused laser deposition

Abstract EN

Transparent dielectric thin films of MgO have been deposited on glass substrates at different oxygen pressure between (50-300) mbar using a pulsed laser deposition technique to ablation of Mg target in the presence of oxygen as reactive atmosphere.

Structural, and optical, properties of these films have been investigated.

The films crystallize in a cubic structure and X-ray diffraction measurements have shown that the polycrystalline MgO films prepared at oxygen pressure (200) mbar and substrate temperature (150°C) with (111) and (002) orientations.

The films deposited at oxygen pressure between (150-300) mbar and substrate temperature (150°C) exhibited highest optical transmittivity (>80%) and the direct band gap energy was found to be 5.01 eV at oxygen pressure (200) mbar.

The measured of the resistivity of the film prepared at oxygen pressure (200) mbar and substrate temperature (150°C) was 1.45x107ῼcm.