Photoemission Spectroscopy Characterization of Attempts to Deposit MoO2 Thin Film
Joint Authors
Source
International Journal of Photoenergy
Issue
Vol. 2011, Issue 2011 (31 Dec. 2011), pp.1-6, 6 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2011-12-11
Country of Publication
Egypt
No. of Pages
6
Main Subjects
Abstract EN
Attempts to deposit molybdenum dioxide (MoO2) thin films have been described.
Electronic structure of films, deposited by thermal evaporation of MoO2 powder, had been investigated with ultraviolet photoemission and X-ray photoemission spectroscopy (UPS and XPS).
The thermally evaporated films were found to be similar to the thermally evaporated MoO3 films at the early deposition stage.
XPS analysis of MoO2 powder reveals presence of +5 and +6 oxidation states in Mo 3d core level along with +4 state.
The residue of MoO2 powder indicates substantial reduction in higher oxidation states while keeping +4 oxidation state almost intact.
Interface formation between chloroaluminum phthalocyanine (AlPc-Cl) and the thermally evaporated film was also investigated.
American Psychological Association (APA)
Irfan, & So, Franky& Gao, Yongli. 2011. Photoemission Spectroscopy Characterization of Attempts to Deposit MoO2 Thin Film. International Journal of Photoenergy،Vol. 2011, no. 2011, pp.1-6.
https://search.emarefa.net/detail/BIM-462744
Modern Language Association (MLA)
Irfan,…[et al.]. Photoemission Spectroscopy Characterization of Attempts to Deposit MoO2 Thin Film. International Journal of Photoenergy No. 2011 (2011), pp.1-6.
https://search.emarefa.net/detail/BIM-462744
American Medical Association (AMA)
Irfan, & So, Franky& Gao, Yongli. Photoemission Spectroscopy Characterization of Attempts to Deposit MoO2 Thin Film. International Journal of Photoenergy. 2011. Vol. 2011, no. 2011, pp.1-6.
https://search.emarefa.net/detail/BIM-462744
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-462744
