Optical and Structural Properties of Titanium Dioxide Films from TiO2 and Ti3O5 Starting Materials Annealed at Various Temperatures

Abstract EN

We investigated the optical and structural properties of titanium dioxide films deposited from Ti3O5 and TiO2 starting materials by electron beam evaporation at annealing temperatures from 400∘C to 800∘C.

We find that the refractive index of as-deposited films from Ti3O5 starting material is higher than that of as-deposited films from TiO2 starting material.

In addition, during thermal annealing, the refractive index fluctuates slightly as compared with TiO2 films from TiO2 starting material.

This should be attributed to the fact that the deposited molecules had a higher packing density, such that the film was denser.

The transmittance spectra of TiO2 films from Ti3O5 starting material indicate that transmittance edge slightly shifts to longer wavelength with the annealing temperature increasing when compared with TiO2 starting material, in which the transmittance spectra indicate that the transmittance edge strongly shifts to longer wavelength with the same annealing temperature increasing.

These findings should be attributed to the absence of oxygen and scattering of rough surface.