Effect of CSi Ratio on the Electrochemical Behavior of a-SiCx : H Coatings on SS301 Substrate Deposited by PECVD

Joint Authors

Li, D.
Guruvenket, S.
Szpunar, Jerzy A.
Klemberg-Sapieha, J. E.

Source

International Journal of Corrosion

Issue

Vol. 2014, Issue 2014 (31 Dec. 2014), pp.1-8, 8 p.

Publisher

Hindawi Publishing Corporation

Publication Date

2014-03-05

Country of Publication

Egypt

No. of Pages

8

Main Subjects

Civil Engineering

Abstract EN

Amorphous hydrogenated silicon carbide (a-SiCx:H) coatings were deposited on stainless steel 301 (SS301) using plasma enhanced chemical vapor deposition with the methane gas flow ranging from 30 to 90 sccm.

XRD spectra confirmed the amorphous structure of these coatings.

The as-deposited coatings all exhibited homogenous dense feature, and no porosities were observed in SEM and AFM analysis.

The a-SiCx:H coatings remarkably increased the corrosion resistance of the SS301 substrate.

With the increase of the C concentration, the a-SiCx:H coatings exhibited significantly enhanced electrochemical behavior.

The a-SiCx:H coating with the highest carbon concentration acted as an excellent barrier to charge transfer, with a corrosion current of 3.5×10-12 A/cm2 and a breakdown voltage of 1.36 V, compared to 2.5×10-8 A/cm2 and 0.34 V for the SS301 substrate.

American Psychological Association (APA)

Li, D.& Guruvenket, S.& Szpunar, Jerzy A.& Klemberg-Sapieha, J. E.. 2014. Effect of CSi Ratio on the Electrochemical Behavior of a-SiCx : H Coatings on SS301 Substrate Deposited by PECVD. International Journal of Corrosion،Vol. 2014, no. 2014, pp.1-8.
https://search.emarefa.net/detail/BIM-481206

Modern Language Association (MLA)

Li, D.…[et al.]. Effect of CSi Ratio on the Electrochemical Behavior of a-SiCx : H Coatings on SS301 Substrate Deposited by PECVD. International Journal of Corrosion No. 2014 (2014), pp.1-8.
https://search.emarefa.net/detail/BIM-481206

American Medical Association (AMA)

Li, D.& Guruvenket, S.& Szpunar, Jerzy A.& Klemberg-Sapieha, J. E.. Effect of CSi Ratio on the Electrochemical Behavior of a-SiCx : H Coatings on SS301 Substrate Deposited by PECVD. International Journal of Corrosion. 2014. Vol. 2014, no. 2014, pp.1-8.
https://search.emarefa.net/detail/BIM-481206

Data Type

Journal Articles

Language

English

Notes

Includes bibliographical references

Record ID

BIM-481206