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High-Efficiency Si Solar Cell Fabricated by Ion Implantation and Inline Backside Rounding Process
Joint Authors
Chang, Sheng-Po
Wu, Ching-In
Chang, Shoou-Jinn
Lee, Chien-Ming
Source
International Journal of Photoenergy
Issue
Vol. 2012, Issue 2012 (31 Dec. 2012), pp.1-7, 7 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2012-12-17
Country of Publication
Egypt
No. of Pages
7
Main Subjects
Abstract EN
We introduce a novel, high-throughput processing method to produce high-efficiency solar cells via a backside rounding process and ion implantation.
Ion implantation combined with a backside rounding process is investigated.
The ion implantation process substituted for thermal POCl3 diffusion performs better Rsheet uniformity (<3%).
The U-4100 spectrophotometer shows that wafers with backside rounding process perform higher reflectivity at long wavelengths.
Industrial screen printed (SP) Al-BSF on different etching depth groups was analyzed.
SEMs show that increasing etch depth improves back surface field (BSF).
The I-V measurement revealed that etching depths of 6 μm ± 0.1 μm due to having the highest VOC and ISC, it has the best performance.
SEMs also show that higher etching depths also produce uniform Al melting and better BSF.
This is in agreement with IQE response data at long wavelengths.
American Psychological Association (APA)
Lee, Chien-Ming& Chang, Sheng-Po& Chang, Shoou-Jinn& Wu, Ching-In. 2012. High-Efficiency Si Solar Cell Fabricated by Ion Implantation and Inline Backside Rounding Process. International Journal of Photoenergy،Vol. 2012, no. 2012, pp.1-7.
https://search.emarefa.net/detail/BIM-489160
Modern Language Association (MLA)
Lee, Chien-Ming…[et al.]. High-Efficiency Si Solar Cell Fabricated by Ion Implantation and Inline Backside Rounding Process. International Journal of Photoenergy No. 2012 (2012), pp.1-7.
https://search.emarefa.net/detail/BIM-489160
American Medical Association (AMA)
Lee, Chien-Ming& Chang, Sheng-Po& Chang, Shoou-Jinn& Wu, Ching-In. High-Efficiency Si Solar Cell Fabricated by Ion Implantation and Inline Backside Rounding Process. International Journal of Photoenergy. 2012. Vol. 2012, no. 2012, pp.1-7.
https://search.emarefa.net/detail/BIM-489160
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-489160