Preparation and characterization of sputtered ZrOz thin films

Abstract EN

Studies' of Zirconia films prepared by D.C.

magnetron sputtering using metal target have been deposited and characterized for the following properties : Oxygen partial pressure .

refractive index .

extinction coefficient and structure .

The as deposited films were x-ray amorphous and the crytallinity increases at higher temperature.

The effect of post deposition annealing, temperature (300-850 C°) as well as the substrate temperature (during deposition ranged from 25-450 C° ) on the properties and structure of these films has also been investigated and showed that annealing result in a decrease in refractive index and increase in extinction coefficient while increasing substrate temperature showed increased in both refractive index and extinction coefficient.