A study and comparsion of hardness for thin aluminum, selenium, indium tin oxide films

Abstract EN

In this paper Al.

Se.

and ITO thin films have been deposited by thermal evaporation in high vacuum 10-6 torr onto glass and metal substrates held at room temperature .

Annealing process for these films at different temperatures has carried out.

The nardness of these mms were measured .

The effect of annealing temperature and films thicknesses on the hardness has been studied .

It is found that the hardness increased with the increasing of annealing temperature in the range (473-573)K.

and decreased with film thicknesses.