Influence of substrate temperature on structural properties of thermally evaporated nano CuPc thin films

Abstract EN

A 200 nm thickness of Copper Phthalocyanine (CuPc) thin films were thermally evaporated at 10-5 mbar in a PVD device on glass substrate at temperature of 303 and 403 oK.

This study focused on the effect of substrate temperature on structural properties of CuPc thin films.

X-ray diffraction analysis (XRD) showed that films were deposited at 303 oK represent β-phase and films were deposited at 403 oK represent α-phase, that is in mean phase transition from β-phase to α-phase in CuPc layers.

Grain size increased from 30 nm for films deposited at 303 oK to 360 nm for the films deposited at 403 oK.

Scanning electron microscope (SEM) and atomic force microscopy (AFM) images showed increasing in CuPc Nano rods sizes , crystallization and surface roughness as substrate temperature increased.