Structure and properties of thin hard coating tialn layers deposited by PVD on heated substrate WC CO

Abstract EN

TiAlN coatings have been widely used for cutting tools, especially for dry and high speed machining.

The properties of the layers deposited by PVD (Physical Vapor Deposition) are affected by many parameters of deposition conditions.

These include percentage and type of reactive gas, vacuum pressure, time of deposition, type of target materials, power of deposition, and temperature of substrate.

In this work, the properties of TiAlN layers deposited on elevated substrate temperature at 480oC at different ratios of nitrogen reactive gas with working pressure 10-2 mbar were studied.

The layers were investigated by scratch test, collate measurements, hardness measurements, impact test, Tribometer pin on disc and Optical microscopy.

The results showed that the maximum hardness of the coating TiAlN layers is 37 Gpa at 20% N2 as reactive gas with substrate temperature of 480oC.