Wettability improvement of mylar substrate using N2 gas and air atmospheric nonthermal plasma jet

Abstract EN

In this paper, the results of wettability improvement of Mylar substrate are presented.

The experimental work is done with an atmospheric-pressure nonthermal plasma jet, ANPJ device.

This device is energized by a low-cost Neon power supply of (10 kV, 30 mA, and 20 kHz).

It is operated separately with N2 gas and compressed air at a flow rate of 12 L/min for each of them and input voltage of 6 kV.

A Mylar substrate is treated using both carrier gases.

The wettability of Mylar substrate is measured using contact angle technique.

The contact angle is detected using two techniques: spherical cap approach and Low-bond axisymmetric drop shape analysis.

The results show wettability improvement of this substrate surface for both carrier gases but the N2 plasma jet is more effective than Air plasma jet.