Preparation of Al2O3 thin films by magnetron sputtering system and study their optical and structural properties

Abstract EN

In this research we prepared (Al2O3) films on substrate of glass by using plasma magnetron sputtering technique.

We studied the structural and optical properties for the prepared films with different thicknesses.

The results of XRD showed that the thin films had a polycrystalline structure with Rhombohedra (Trigonal)lattice unit cell.

Surface morphology and the roughness of the prepared films were diagnostic by atomic force microscope (AFM).

Where the results showed that the roughness increased from (11-24.4)nm with increasing thickness from(60-308)nm.

optical properties of the prepared films with in(300-1100)nm showed that the absorption of the films decreased with increases of wavelength for all thicknesses, and transmittance of the films increased with increases of wavelength for all thicknesses.

The results of optical measurement showed that the optical energy gap for the prepared films increased from (3.65-3.95)eV with increases thickness from (60-308)nm.

http://dx.doi.org/10.31257/2018/JKP/100103