Application of scanning hall probe microscopy technique at room temperature 300k

Abstract EN

Active areas of bismuth Hall Probe sensors in the range (0.1–1) µm have been fabricated on Si / SiO2 with GaAs substrates at thickness of bismuth from (40, 60 and 70) nm by Electron Beam Lithography (EBL) and lift-off process.

Scanning Hall probe microscopy (SHPM) technique at room temperature (300) K used to study Hall voltage, characterization of the noise figures and minimum detectable fields.

Results are presented for both 0.4µm sensor, which is found minimum detectable fields (Bmin) 1.1 G / Hz0.5 with dc currents about 5µA.

But minimum detectable fields for HP size 0.6 µm at dc currents 20µA is Bmin 0.6 G / Hz0.5.

The performance of our Hall probe devices at 300K could be improved still further are discussed