Morphological and optical properties of V2O5 : TiO2 thin film prepared by PLD technique

Abstract EN

In this work, pure and doped Vanadium Pentoxide (V2O5) thin films with different concentration of TiO2 (0, 0.1, 0.3, 0.5) wt were obtained using Pulse laser deposition technique on amorphous glass substrate with thickness of (250) nm.

The morphological, UV-Visible and Fourier Transform Infrared Spectroscopy (FT-IR) were studied.

TiO2 doping into V2O5 matrix revealed an interesting morphological change from an array of high density pure V2O5 nanorods (~140 nm) to granular structure in TiO2-doped V2O5 thin film.

Transform Infrared Spectroscopy (FTIR) are used to analyze structural properties of as-deposit.

The transmittance and absorption of each film, in the spectral range 300 to 1100 nm, were measured from which the optical constants (Refractive index, Absorption coefficient, Extinction coefficient and Energy gap) were determine d.The energy band gap of the films was found to be change from (2.38 to 2.9) eV when the concentration of TiO2 increases from (2.78 to 2.9) eV The results showed a significant improvement in the transmittance and refractive index in TiO2 doped V2O5 thin films .All measured values were in consistent with other previous studies.