Assessing the Oxidative Degradation of N-Methylpyrrolidone (NMP) in Microelectronic Fabrication Processes by Using a Multiplatform Analytical Approach
المؤلفون المشاركون
Lennon, Gavin
Willox, Shannon
Ramdas, Ragini
Funston, Scott J.
Klun, Matthew
Pieh, Robert
Fairlie, Stewart
Dobbin, Sara
Cobice, Diego F.
المصدر
Journal of Analytical Methods in Chemistry
العدد
المجلد 2020، العدد 2020 (31 ديسمبر/كانون الأول 2020)، ص ص. 1-12، 12ص.
الناشر
Hindawi Publishing Corporation
تاريخ النشر
2020-03-04
دولة النشر
مصر
عدد الصفحات
12
التخصصات الرئيسية
الملخص EN
During the construction of recording head devices, corrosion of metal features and subsequent deposition of corrosion by-products have been observed.
Previous studies have determined that the use of N-methylpyrrolidone (NMP) may be a contributing factor.
In this study, we report the use of a novel multiplatform analytical approach comprising of pH, liquid chromatography/UV detection (LC/UV), inductively coupled plasma optical emission spectroscopy (ICP-OES), and LC/mass spectrometry (LC/MS) to demonstrate that reaction conditions mimicking those of general photoresist removal processes can invoke the oxidation of NMP during the photolithography lift-off process.
For the first time, we have confirmed that the oxidation of NMP lowers the pH, facilitating the dissolution of transition metals deposited on wafer substrates during post-mask and pre-lift-off processes in microelectronic fabrication.
This negatively impacts upon the performance of the microelectronic device.
Furthermore, it was shown that, by performing the process in an inert atmosphere, the oxidation of NMP was suppressed and the pH was stabilized, suggesting an affordable modification of the photolithography lift-off stage to enhance the quality of recording heads.
This novel study has provided key data that may have a significant impact on current and future fabrication process design, optimization, and control.
Results here suggest the inclusion of pH as a key process input variable (KPIV) during the design of new photoresist removal processes.
نمط استشهاد جمعية علماء النفس الأمريكية (APA)
Lennon, Gavin& Willox, Shannon& Ramdas, Ragini& Funston, Scott J.& Klun, Matthew& Pieh, Robert…[et al.]. 2020. Assessing the Oxidative Degradation of N-Methylpyrrolidone (NMP) in Microelectronic Fabrication Processes by Using a Multiplatform Analytical Approach. Journal of Analytical Methods in Chemistry،Vol. 2020, no. 2020, pp.1-12.
https://search.emarefa.net/detail/BIM-1174869
نمط استشهاد الجمعية الأمريكية للغات الحديثة (MLA)
Lennon, Gavin…[et al.]. Assessing the Oxidative Degradation of N-Methylpyrrolidone (NMP) in Microelectronic Fabrication Processes by Using a Multiplatform Analytical Approach. Journal of Analytical Methods in Chemistry No. 2020 (2020), pp.1-12.
https://search.emarefa.net/detail/BIM-1174869
نمط استشهاد الجمعية الطبية الأمريكية (AMA)
Lennon, Gavin& Willox, Shannon& Ramdas, Ragini& Funston, Scott J.& Klun, Matthew& Pieh, Robert…[et al.]. Assessing the Oxidative Degradation of N-Methylpyrrolidone (NMP) in Microelectronic Fabrication Processes by Using a Multiplatform Analytical Approach. Journal of Analytical Methods in Chemistry. 2020. Vol. 2020, no. 2020, pp.1-12.
https://search.emarefa.net/detail/BIM-1174869
نوع البيانات
مقالات
لغة النص
الإنجليزية
الملاحظات
Includes bibliographical references
رقم السجل
BIM-1174869
قاعدة معامل التأثير والاستشهادات المرجعية العربي "ارسيف Arcif"
أضخم قاعدة بيانات عربية للاستشهادات المرجعية للمجلات العلمية المحكمة الصادرة في العالم العربي
تقوم هذه الخدمة بالتحقق من التشابه أو الانتحال في الأبحاث والمقالات العلمية والأطروحات الجامعية والكتب والأبحاث باللغة العربية، وتحديد درجة التشابه أو أصالة الأعمال البحثية وحماية ملكيتها الفكرية. تعرف اكثر