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Assessing the Oxidative Degradation of N-Methylpyrrolidone (NMP) in Microelectronic Fabrication Processes by Using a Multiplatform Analytical Approach
Joint Authors
Lennon, Gavin
Willox, Shannon
Ramdas, Ragini
Funston, Scott J.
Klun, Matthew
Pieh, Robert
Fairlie, Stewart
Dobbin, Sara
Cobice, Diego F.
Source
Journal of Analytical Methods in Chemistry
Issue
Vol. 2020, Issue 2020 (31 Dec. 2020), pp.1-12, 12 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2020-03-04
Country of Publication
Egypt
No. of Pages
12
Main Subjects
Abstract EN
During the construction of recording head devices, corrosion of metal features and subsequent deposition of corrosion by-products have been observed.
Previous studies have determined that the use of N-methylpyrrolidone (NMP) may be a contributing factor.
In this study, we report the use of a novel multiplatform analytical approach comprising of pH, liquid chromatography/UV detection (LC/UV), inductively coupled plasma optical emission spectroscopy (ICP-OES), and LC/mass spectrometry (LC/MS) to demonstrate that reaction conditions mimicking those of general photoresist removal processes can invoke the oxidation of NMP during the photolithography lift-off process.
For the first time, we have confirmed that the oxidation of NMP lowers the pH, facilitating the dissolution of transition metals deposited on wafer substrates during post-mask and pre-lift-off processes in microelectronic fabrication.
This negatively impacts upon the performance of the microelectronic device.
Furthermore, it was shown that, by performing the process in an inert atmosphere, the oxidation of NMP was suppressed and the pH was stabilized, suggesting an affordable modification of the photolithography lift-off stage to enhance the quality of recording heads.
This novel study has provided key data that may have a significant impact on current and future fabrication process design, optimization, and control.
Results here suggest the inclusion of pH as a key process input variable (KPIV) during the design of new photoresist removal processes.
American Psychological Association (APA)
Lennon, Gavin& Willox, Shannon& Ramdas, Ragini& Funston, Scott J.& Klun, Matthew& Pieh, Robert…[et al.]. 2020. Assessing the Oxidative Degradation of N-Methylpyrrolidone (NMP) in Microelectronic Fabrication Processes by Using a Multiplatform Analytical Approach. Journal of Analytical Methods in Chemistry،Vol. 2020, no. 2020, pp.1-12.
https://search.emarefa.net/detail/BIM-1174869
Modern Language Association (MLA)
Lennon, Gavin…[et al.]. Assessing the Oxidative Degradation of N-Methylpyrrolidone (NMP) in Microelectronic Fabrication Processes by Using a Multiplatform Analytical Approach. Journal of Analytical Methods in Chemistry No. 2020 (2020), pp.1-12.
https://search.emarefa.net/detail/BIM-1174869
American Medical Association (AMA)
Lennon, Gavin& Willox, Shannon& Ramdas, Ragini& Funston, Scott J.& Klun, Matthew& Pieh, Robert…[et al.]. Assessing the Oxidative Degradation of N-Methylpyrrolidone (NMP) in Microelectronic Fabrication Processes by Using a Multiplatform Analytical Approach. Journal of Analytical Methods in Chemistry. 2020. Vol. 2020, no. 2020, pp.1-12.
https://search.emarefa.net/detail/BIM-1174869
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-1174869