Photostabilization of polystyrene films by some schiff base compounds

الملخص EN

Two Schiff base compounds, N-(3-ol-l-methyl butylidene (4-amino) aniline, (SB1) and N-(l-hydroxl)-2-naphthyl methylene (4-chloro-2-methoxy) aniline (SB2), were synthesized and characterized.

Their behavior in photo stabilization and photo degradation processes of polystyrene (PS.) films were investigated by measuring the carbonyl index (ICO) and hydroxyl index (IOH).

The Schiff base SB!, And SB2 stabilize the polymer films.

Effect of Schiff bases concentration was also monitored.

According to the experimental results obtained, reaction mechanisms were suggested for photo stabilization of the polymer.