Photostabilization of polystyrene films by some schiff base compounds
Author
Source
Sudan Journal of Basic Sciences. |n Series : Chemistry
Issue
Vol. 6, Issue 15 (28 Feb. 2009), pp.39-50, 12 p.
Publisher
Sudan Institute for Natural Sciences Publication Unit
Publication Date
2009-02-28
Country of Publication
Sudan
No. of Pages
12
Main Subjects
Abstract EN
Two Schiff base compounds, N-(3-ol-l-methyl butylidene (4-amino) aniline, (SB1) and N-(l-hydroxl)-2-naphthyl methylene (4-chloro-2-methoxy) aniline (SB2), were synthesized and characterized.
Their behavior in photo stabilization and photo degradation processes of polystyrene (PS.) films were investigated by measuring the carbonyl index (ICO) and hydroxyl index (IOH).
The Schiff base SB!, And SB2 stabilize the polymer films.
Effect of Schiff bases concentration was also monitored.
According to the experimental results obtained, reaction mechanisms were suggested for photo stabilization of the polymer.
American Psychological Association (APA)
Abd al-Baqi, Adil O.. 2009. Photostabilization of polystyrene films by some schiff base compounds. Sudan Journal of Basic Sciences. |n Series : Chemistry،Vol. 6, no. 15, pp.39-50.
https://search.emarefa.net/detail/BIM-272273
Modern Language Association (MLA)
Abd al-Baqi, Adil O.. Photostabilization of polystyrene films by some schiff base compounds. Sudan Journal of Basic Sciences. |n Series : Chemistry Vol. 6, no. 15 (Feb. 2009), pp.39-50.
https://search.emarefa.net/detail/BIM-272273
American Medical Association (AMA)
Abd al-Baqi, Adil O.. Photostabilization of polystyrene films by some schiff base compounds. Sudan Journal of Basic Sciences. |n Series : Chemistry. 2009. Vol. 6, no. 15, pp.39-50.
https://search.emarefa.net/detail/BIM-272273
Data Type
Journal Articles
Language
English
Notes
Includes appendices : p. 46-50
Record ID
BIM-272273
