The effect of chemical polishing on polysilicon surface

الملخص EN

Chemical polishing of polysilicon (Poly Si) has been investigated us-ing scanning electron microscopy (SEM), reflectance spectrophotometry and dark electrical [-٧ measurements.

It was observed that chemical pol-ishing affects surface roughness and shows deeper etching at grain boun-daries.

It was also found that etching by solution A for 15 minutes pro-duces a low reflectivity surface and better quality Al-poly Si (P-type) Schottky diodes.