Single-Ion Implantation for the Development of Si-Based MOSFET Devices with Quantum Functionalities

المؤلفون المشاركون

Alves, Andrew D.
Thompson, Samuel C.
van Donkelaar, Jessica A.
McCallum, Jeffrey C.
Johnson, Brett C.
Jamieson, David N.
Yang, Changyi
Hopf, Toby

المصدر

Advances in Materials Science and Engineering

العدد

المجلد 2012، العدد 2012 (31 ديسمبر/كانون الأول 2012)، ص ص. 1-10، 10ص.

الناشر

Hindawi Publishing Corporation

تاريخ النشر

2011-11-28

دولة النشر

مصر

عدد الصفحات

10

التخصصات الرئيسية

العلوم الهندسية و تكنولوجيا المعلومات

الملخص EN

Interest in single-ion implantation is driven in part by research into development of solid-state devices that exhibit quantum behaviour in their electronic or optical characteristics.

Here, we provide an overview of international research work on single ion implantation and single ion detection for development of electronic devices for quantum computing.

The scope of international research into single ion implantation is presented in the context of our own research in the Centre for Quantum Computation and Communication Technology in Australia.

Various single ion detection schemes are presented, and limitations on dopant placement accuracy due to ion straggling are discussed together with pathways for scale-up to multiple quantum devices on the one chip.

Possible future directions for ion implantation in quantum computing and communications are also discussed.

نمط استشهاد جمعية علماء النفس الأمريكية (APA)

McCallum, Jeffrey C.& Jamieson, David N.& Yang, Changyi& Alves, Andrew D.& Johnson, Brett C.& Hopf, Toby…[et al.]. 2011. Single-Ion Implantation for the Development of Si-Based MOSFET Devices with Quantum Functionalities. Advances in Materials Science and Engineering،Vol. 2012, no. 2012, pp.1-10.
https://search.emarefa.net/detail/BIM-459302

نمط استشهاد الجمعية الأمريكية للغات الحديثة (MLA)

McCallum, Jeffrey C.…[et al.]. Single-Ion Implantation for the Development of Si-Based MOSFET Devices with Quantum Functionalities. Advances in Materials Science and Engineering No. 2012 (2012), pp.1-10.
https://search.emarefa.net/detail/BIM-459302

نمط استشهاد الجمعية الطبية الأمريكية (AMA)

McCallum, Jeffrey C.& Jamieson, David N.& Yang, Changyi& Alves, Andrew D.& Johnson, Brett C.& Hopf, Toby…[et al.]. Single-Ion Implantation for the Development of Si-Based MOSFET Devices with Quantum Functionalities. Advances in Materials Science and Engineering. 2011. Vol. 2012, no. 2012, pp.1-10.
https://search.emarefa.net/detail/BIM-459302

نوع البيانات

مقالات

لغة النص

الإنجليزية

الملاحظات

Includes bibliographical references

رقم السجل

BIM-459302