KLL Dielectronic Recombination of Highly Charged Sulfur and Silicon Ions

المؤلف

Ali, Safdar

المصدر

Journal of Atomic and Molecular Physics

العدد

المجلد 2014، العدد 2014 (31 ديسمبر/كانون الأول 2014)، ص ص. 1-5، 5ص.

الناشر

Hindawi Publishing Corporation

تاريخ النشر

2014-05-21

دولة النشر

مصر

عدد الصفحات

5

التخصصات الرئيسية

الفيزياء

الملخص EN

Dielectronic recombination measurements for highly charged ions were performed at the Stockholm refrigerated electron beam ion trap.

We have obtained KLL DR resonance strengths for highly charged H- and He-like sulfur and silicon ions.

The experimental results are compared with the theoretical data obtained from GRASP II code.

Both the experimental and calculated results agree well within the experimental error bars.

Moreover, the dielectronic recombination resonance strengths are used to obtain the new scaling parameters by incorporating our results with the previous measurements and to check the behaviour of scaling formula for H- and He-like isoelectronic sequences.

نمط استشهاد جمعية علماء النفس الأمريكية (APA)

Ali, Safdar. 2014. KLL Dielectronic Recombination of Highly Charged Sulfur and Silicon Ions. Journal of Atomic and Molecular Physics،Vol. 2014, no. 2014, pp.1-5.
https://search.emarefa.net/detail/BIM-496000

نمط استشهاد الجمعية الأمريكية للغات الحديثة (MLA)

Ali, Safdar. KLL Dielectronic Recombination of Highly Charged Sulfur and Silicon Ions. Journal of Atomic and Molecular Physics No. 2014 (2014), pp.1-5.
https://search.emarefa.net/detail/BIM-496000

نمط استشهاد الجمعية الطبية الأمريكية (AMA)

Ali, Safdar. KLL Dielectronic Recombination of Highly Charged Sulfur and Silicon Ions. Journal of Atomic and Molecular Physics. 2014. Vol. 2014, no. 2014, pp.1-5.
https://search.emarefa.net/detail/BIM-496000

نوع البيانات

مقالات

لغة النص

الإنجليزية

الملاحظات

Includes bibliographical references

رقم السجل

BIM-496000