General characterization of argon plasma induced by microwave source

العناوين الأخرى

توصيف عام لبلازما الأرجون المحتثة بواسطة مصدر أشعة مايكرووية

مقدم أطروحة جامعية

Ali, Ali Husayn Muhammad

مشرف أطروحة جامعية

Wasfi, Ahmad Salman

أعضاء اللجنة

Khalaf, Thamir H.
Khamis, Rad Azzawi
Husayn, Ali Abd al-Karim

الجامعة

جامعة بغداد

الكلية

كلية العلوم

القسم الأكاديمي

قسم الفيزياء

دولة الجامعة

العراق

الدرجة العلمية

ماجستير

تاريخ الدرجة العلمية

2013

الملخص الإنجليزي

In this work a simple and inexpensive microwave plasma source was arranged and characterized.

An argon plasma was generated using a magnetron as a microwave source which was part of a domestic microwave oven.

This magnetron works at a frequency of 2.45 GHz and its power can be controlled from 400 W to 750 W by adjusting the applied potential.

The argon gas was contained in an evacuated Pyrex tube which was inserted inside the microwave oven and expanded outside the oven from its top side.

Characterizations were made to the argon plasma which expanded outside the microwave interaction zone with the gas load, the information gathered from the double Langmuir probe which prepared to measure the important plasma parameters such as electron temperature (Te) and density (ne).

The effect of many variables such as gas pressure, microwave power and position of the probe through the plasma chamber on the electron temperature and density were examined carefully.

It was observed that the increase of microwave power tends to increase both electron temperature and density while increasing the gas pressure and axial position of the probe away from the interaction zone tend to decrease them.

The maximum electron temperature and density were obtained around 20 eV and 8x1010 cm-3, respectively.

التخصصات الرئيسية

الفيزياء

عدد الصفحات

69

قائمة المحتويات

• APA
• MLA
• AMA

لغة النص

الإنجليزية

نوع البيانات

رسائل جامعية

رقم السجل

BIM-606802