General characterization of argon plasma induced by microwave source

Other Title(s)

توصيف عام لبلازما الأرجون المحتثة بواسطة مصدر أشعة مايكرووية

Dissertant

Ali, Ali Husayn Muhammad

Thesis advisor

Wasfi, Ahmad Salman

Comitee Members

Khalaf, Thamir H.
Khamis, Rad Azzawi
Husayn, Ali Abd al-Karim

University

University of Baghdad

Faculty

College of Science

Department

Department of Physics

University Country

Iraq

Degree

Master

Degree Date

2013

English Abstract

In this work a simple and inexpensive microwave plasma source was arranged and characterized.

An argon plasma was generated using a magnetron as a microwave source which was part of a domestic microwave oven.

This magnetron works at a frequency of 2.45 GHz and its power can be controlled from 400 W to 750 W by adjusting the applied potential.

The argon gas was contained in an evacuated Pyrex tube which was inserted inside the microwave oven and expanded outside the oven from its top side.

Characterizations were made to the argon plasma which expanded outside the microwave interaction zone with the gas load, the information gathered from the double Langmuir probe which prepared to measure the important plasma parameters such as electron temperature (Te) and density (ne).

The effect of many variables such as gas pressure, microwave power and position of the probe through the plasma chamber on the electron temperature and density were examined carefully.

It was observed that the increase of microwave power tends to increase both electron temperature and density while increasing the gas pressure and axial position of the probe away from the interaction zone tend to decrease them.

The maximum electron temperature and density were obtained around 20 eV and 8x1010 cm-3, respectively.

Main Subjects

Physics

No. of Pages

69

Table of Contents

• APA
• MLA
• AMA

Language

English

Data Type

Arab Theses

Record ID

BIM-606802